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Only the surface atoms in an adsorbent p...

Only the surface atoms in an adsorbent play an active role in adsorption. These atoms possess some residual force such as van der Waals forces and chemical forces. In the process of adsorption. Weak adsorbate is substituting by strong adsorbete. Activated charcoal used in the gas mask is already exposed to the atmospheric air, so gases and water vapours in air are adsorbed on its surface. When the mask is exposed to chlorine atmosphere, the gases are displaced by chlorine. In general, easily liquefiable gases such as `CO_(2),NH_(3),Cl_(2),` and `SO_(2)` are adsorbed to a greater extent than the elemental gases, e.g., `H_(2),N_(2),O_(2),` He, etc.
Gas mask works on the principle of

A

Physical adsorption

B

Chemical adsorption

C

both physical and chemical adsorption

D

absorption

Text Solution

Verified by Experts

The correct Answer is:
C
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Only the surface atoms in an adsorbent play an active role in adsorption. These atoms possess some residual force such as van der Waals forces and chemical forces. In the process of adsorption. Weak adsorbate is substituting by strong adsorbete. Activated charcoal used in the gas mask is already exposed to the atmospheric air, so gases and water vapours in air are adsorbed on its surface. When the mask is exposed to chlorine atmosphere, the gases are displaced by chlorine. In general, easily liquefiable gases such as CO_(2),NH_(3),Cl_(2), and SO_(2) are adsorbed to a greater extent than the elemental gases, e.g., H_(2),N_(2),O_(2), He, etc. Gas mask contaons

Only the surface atoms in an adsorbent play an active role in adsorption. These atoms possess some residual force such as van der Waals forces and chemical forces. In the process of adsorption. Weak adsorbate is substituting by strong adsorbete. Activated charcoal used in the gas mask is already exposed to the atmospheric air, so gases and water vapours in air are adsorbed on its surface. When the mask is exposed to chlorine atmosphere, the gases are displaced by chlorine. In general, easily liquefiable gases such as CO_(2),NH_(3),Cl_(2), and SO_(2) are adsorbed to a greater extent than the elemental gases, e.g., H_(2),N_(2),O_(2), He, etc. In physical adsorption, the forces associated are

Only the surface atoms in an adsorbent play an active role in adsorption. These atoms possess some residual force such as van der Waals forces and chemical forces. In the process of adsorption. Weak adsorbate is substituting by strong adsorbete. Activated charcoal used in the gas mask is already exposed to the atmospheric air, so gases and water vapours in air are adsorbed on its surface. When the mask is exposed to chlorine atmosphere, the gases are displaced by chlorine. In general, easily liquefiable gases such as CO_(2),NH_(3),Cl_(2), and SO_(2) are adsorbed to a greater extent than the elemental gases, e.g., H_(2),N_(2),O_(2), He, etc. Which of the following gases will be most easily adsorbed by the charcoal in the gas mask?

Only the surface atoms in an adsorbent play an active role in adsorption. These atoms possess some residual force such as van der Waals forces and chemical forces. In the process of adsorption. Weak adsorbate is substituting by strong adsorbete. Activated charcoal used in the gas mask is already exposed to the atmospheric air, so gases and water vapours in air are adsorbed on its surface. When the mask is exposed to chlorine atmosphere, the gases are displaced by chlorine. In general, easily liquefiable gases such as CO_(2),NH_(3),Cl_(2), and SO_(2) are adsorbed to a greater extent than the elemental gases, e.g., H_(2),N_(2),O_(2), He, etc. Which of the following gases will substitute O_(2) from adsorbed charcoal?

In the case of adsorption the concentration of adsorbate is

Knowledge Check

  • Only the surface atoms in an adsorbent play an active role in adsorption. These atoms possess some residual force such as van der Waals forces and chemical forces. In the process of adsorption. Weak adsorbate is substituting by strong adsorbete. Activated charcoal used in the gas mask is already exposed to the atmospheric air, so gases and water vapours in air are adsorbed on its surface. When the mask is exposed to chlorine atmosphere, the gases are displaced by chlorine. In general, easily liquefiable gases such as CO_(2),NH_(3),Cl_(2), and SO_(2) are adsorbed to a greater extent than the elemental gases, e.g., H_(2),N_(2),O_(2), He, etc. Gas mask contaons

    A
    Charcoal granules
    B
    Calcium carbonate
    C
    Fuller's earth
    D
    Powdered charcoal

  • Only the surface atoms in an adsorbent play an active role in adsorption. These atoms possess some residual force such as van der Waals forces and chemical forces. In the process of adsorption. Weak adsorbate is substituting by strong adsorbete. Activated charcoal used in the gas mask is already exposed to the atmospheric air, so gases and water vapours in air are adsorbed on its surface. When the mask is exposed to chlorine atmosphere, the gases are displaced by chlorine. In general, easily liquefiable gases such as CO_(2),NH_(3),Cl_(2), and SO_(2) are adsorbed to a greater extent than the elemental gases, e.g., H_(2),N_(2),O_(2), He, etc. In physical adsorption, the forces associated are

    A
    Ionic
    B
    covalent
    C
    van der Waals
    D
    `H-bonding

  • Only the surface atoms in an adsorbent play an active role in adsorption. These atoms possess some residual force such as van der Waals forces and chemical forces. In the process of adsorption. Weak adsorbate is substituting by strong adsorbete. Activated charcoal used in the gas mask is already exposed to the atmospheric air, so gases and water vapours in air are adsorbed on its surface. When the mask is exposed to chlorine atmosphere, the gases are displaced by chlorine. In general, easily liquefiable gases such as CO_(2),NH_(3),Cl_(2), and SO_(2) are adsorbed to a greater extent than the elemental gases, e.g., H_(2),N_(2),O_(2), He, etc. Which of the following gases will be most easily adsorbed by the charcoal in the gas mask?

    A
    `H_(2)`
    B
    `SO_(2)`
    C
    `N_(2)`
    D
    `O_(2)`